Herstellungsverfahren für Mikromaschine

摘要

Mfr. of a three-dimensional Si structure (10) on a substrate (1) which at least partly overlies and is supported by a silica layer (5) comprises removing the silica in two steps: the first is a rapid liq. or gaseous etch removing most of the silica but leaving enough to support the structure during a wash cycle; the second comprises anhydrous HF gas flowing at 20 litres/minute with no water being present.