GAS SUPPLY SYSTEM USED FOR SEMICONDUCTOR MANUFACTURING PROCESS

摘要

PURPOSE: A gas supply system used for a semiconductor manufacturing process is provided to prevent a wafer from being damaged by preventing the wafer from being slipped which may be caused by a backward gas. CONSTITUTION: A gas supply system used for a semiconductor manufacturing process includes a control part(24) for controlling a flow rate adjuster(18) and a valve(20). The flow rate adjuster(18) adjusts an amount of gas directed to a wafer heating device(2) of a semiconductor manufacturing apparatus. The control part(4) is designed to control a backward gas bypass valve using an air control line of a backside valve. The backward gas bypass valve(22) is a normal open-type valve so that the backward gas cannot be directed to a heat block for loading and heating a wafer, thereby realizing a stable movement of the wafer(10) during a semiconductor manufacturing process.