| 摘要 |
PROBLEM TO BE SOLVED: To provide a top surface imaging technology for controlling the width of top pole tips in a magneto resistance(MR) or large-sized magnetro resistance read/write head. SOLUTION: An upper part photoresist layer 18 which is relatively thin is patterned with an improved resolution and, next, an intermediate metal or a ceramic layer 16 is stipulated by using the upper part photoresist layer 18 as a reactive ion etching(RIE) mask and the lowermost thick photoresist layer 14 is stipulated in a second RIE process by using the intermediate layer as an etching mask. Thus, the submicron width of pole tips is sharply improved and, at the same time, a high aspect ratio, a high vertical profile and a critical dimension control which is extremely improved are provided. |
