发明名称 |
Method for manufacturing an electrostatic deflector |
摘要 |
The present invention relates to a charged particle beam exposure apparatus, deflecting a charged particle beam formed into a predetermined shape by being passed through a predetermined transmission mask, and irradiating a predetermined location on the surface of a sample with the charged particle beam. The apparatus comprises: a mirror barrel through which the charged particle beam is passed; and an electrostatic deflector, provided in the mirror barrel, for deflecting the charged particle beam. The electrostatic deflector has a plurality of pairs of electrodes, which are made of a conductive material having carbon as a primary element and are embedded in an internal face of an insulating cylinder. The present invention also relates to a method for forming the electrostatic deflector.
|
申请公布号 |
US6055719(A) |
申请公布日期 |
2000.05.02 |
申请号 |
US19980035105 |
申请日期 |
1998.03.05 |
申请人 |
FUJITSU LIMITED |
发明人 |
OOAEH, YOSHIHISA;ABE, TOMOHIKO;YASUDA, HIROSHI |
分类号 |
G09F21/04;H01J37/147;H01J37/305;H01L21/027;(IPC1-7):G09F21/04 |
主分类号 |
G09F21/04 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|