发明名称 Method for manufacturing an electrostatic deflector
摘要 The present invention relates to a charged particle beam exposure apparatus, deflecting a charged particle beam formed into a predetermined shape by being passed through a predetermined transmission mask, and irradiating a predetermined location on the surface of a sample with the charged particle beam. The apparatus comprises: a mirror barrel through which the charged particle beam is passed; and an electrostatic deflector, provided in the mirror barrel, for deflecting the charged particle beam. The electrostatic deflector has a plurality of pairs of electrodes, which are made of a conductive material having carbon as a primary element and are embedded in an internal face of an insulating cylinder. The present invention also relates to a method for forming the electrostatic deflector.
申请公布号 US6055719(A) 申请公布日期 2000.05.02
申请号 US19980035105 申请日期 1998.03.05
申请人 FUJITSU LIMITED 发明人 OOAEH, YOSHIHISA;ABE, TOMOHIKO;YASUDA, HIROSHI
分类号 G09F21/04;H01J37/147;H01J37/305;H01L21/027;(IPC1-7):G09F21/04 主分类号 G09F21/04
代理机构 代理人
主权项
地址