| 摘要 |
PURPOSE: A gas supplying method of semiconductor manufacturing equipment is to prevent a by-product sunken in a process chamber from acting as a process bad factor. CONSTITUTION: A gas supplying method of semiconductor manufacturing equipment comprises supplying simultaneously a washing gas and a reaction gas to an interior of a process chamber(28) through a separate gas supplying line. The washing gas is Ar gas. A gas supplying line(18,20,22,24) are respectively coupled to an integration line(26). The integration line is coupled to the process chamber. An air valve(54) is provided on the integration line. A predetermined amount of Ar gas is stored within an Ar gas supplying source(10). An Ar gas supplying line(18) is branched from the Ar gas supplying source. A regulator(30), a check valve(32), and an air valve(34) are provided on the Ar gas supplying line. The regulator and the air valve are controlled in a switching operation by a controlling unit.
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