POWER CUTOFF FOR METAL FILM DEPOSITION EQUIPMENT

摘要

PURPOSE: A power cutoff for metal film deposition equipment is provided which could prevent the execution of sputtering with hardware when loading error of wafer is occurred or process time and power exceed. CONSTITUTION: In executing sputtering by permitting direct-current voltage to target(6)placed in the opposite side of wafer(4) loaded inside of vacuum chamber(2), the power cutoff comprises of regular-shutting switch(14) having push button in the middle of line(12), which connects the target(6) and direct-current power supply(10).