| 摘要 |
Provided is a positive photosensitive composition which has high photosensitivity, is capable of giving an excellent resist pattern, and changes little with time after exposure. The positive photosensitive composition comprises a resin having group(s) capable of decomposing by the action of an acid to enhance solubility of the resin in an alkaline developing solution and a compound represented by formula (Ia) or (Ib) which is capable of generating a sulfonic acid upon irradiation with actinic rays or a radiation: wherein R1 to R3 each represents a hydrogen atom, an alkyl group, a cycloalkyl group, an alkoxy group, a hydroxy group, a halogen atom, or a group represented by -S-R4, where R4 represents an alkyl group or an aryl group; X- represents the specific anion of a benzenesulfonic, naphthalenesulfonic, or anthracenesulfonic acid; and l, m, and n represents an integer of 1 to 3.
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