发明名称 |
Method to improve the breakdown voltage of P-channel devices |
摘要 |
A P-channel MOS device having an elevated breakdown voltage is created without increasing device size or requiring additional fabrication steps. During the P-field implant step, P type dopant is implanted into regions of the silicon expected to lie along the silicon-silicon dioxide interface after silicon dioxide growth. P type dopant implanted in this manner counteracts the effect of phosphorous accumulation at the silicon-silicon dioxide interface due to segregation of N type dopant during subsequent silicon dioxide growth steps
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申请公布号 |
US6033960(A) |
申请公布日期 |
2000.03.07 |
申请号 |
US19980006600 |
申请日期 |
1998.01.13 |
申请人 |
NATIONAL SEMICONDUCTOR CORPORATION |
发明人 |
SHACHAM, ETAN |
分类号 |
H01L21/762;H01L21/8234;(IPC1-7):H01L21/336 |
主分类号 |
H01L21/762 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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