| 摘要 |
PURPOSE: An exposure device is provided to obtain a catadioptric optical system depending upon principles such as many openings, a great image field, a sufficient laser bandwidth, and a strong and stable structure. CONSTITUTION: The device comprises an object side catadioptric system, a medium image, and a refraction lens system having lenses made of a first and a second materials. Four lenses and less, preferably three lenses and less, are made of the second material. The lens system includes a first lens group of positive refraction power, a second lens group of negative refraction power, a third lens group of the positive refraction power, a fourth lens group of the negative refraction power, and a fifth lens group of the positive refraction power.
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