| 摘要 |
PURPOSE: A solid pickup device is provided to improve defect characteristics and sensitivity of a charge coupled device by differentiating deposition thickness of an insulating layer from final thickness of the insulating layer after nitrogen annealing. CONSTITUTION: The device comprises a plurality of photoelectric conversion regions formed in a second conductive well region formed on a first conductive substrate; a plurality of charge coupled devices formed between the photoelectric conversion regions; a channel stop layer formed around the photoelectric regions; a plurality of first and second gates, insulated by a gate insulating layer and a first and a second insulating layers on the charge coupled device channel regions, overlapping each other to be continuously formed; a metal shading layer formed on the second insulating layer excluding the photoelectric conversion region; an oxide layer, as an interlayer insulating film, formed on an overall surface including the metal shading layer; an insulating layer for planarization formed on the oxide layer; a color filter layer formed on the insulating layer for planarization corresponding to the photoelectric conversion region; and a micro lens formed on the insulating layer for planarization to correspond to the color filter layer and the photoelectric conversion region.
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