| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a composition excellent in a residual film ratio, resist profile, and the like to deep ultraviolet rays by containing a polymer with specific partial structure. SOLUTION: This positive photosensitive resin composition contains a compound producing acid by active light, a polymer with partial structure expressed by a formula, a nitrogen contained basic compound, and a fluorinated and/or silicone surfactant. In the formula, R1-R4 independently represent hydrogen atom. hydroxyl group, carboxyl group or alkyl group. R1 and R3, or R2 and R4 can be bonded to each other to form a ring. X represents a bivalent organic residual group of 2-20 in the number of carbon, R5 represents hydrogen atom, alkyl group, substitutional alkyl group or a group expressed by -COOR5 and composing a group decomposed under the action of acid. Z represents an atom group forming a cyclohexane ring or a decalin ring together with a carbon atom. Y is expressed by a formula II, where R6, R7 independently represent hydrogen atom or methyl group, and n represents 1 or 2.</p> |
