| 摘要 |
The invention relates to a lighting system for microlithography, comprising an excimer laser (1) with an emission wavelength, a beam expanding system (2), a light mixer system (5) and an illumination plane. In said system an optical element (DP) made of a double refracting material is arranged in a light beam cross-section (for example a Hanle depolarizer) and the thickness of said element varies across the light beam cross-section by a multiple of the emission wavelength. At least one light mixer system (A1, L1, 5) is positioned downstream of the optical element. |
