| 摘要 |
PROBLEM TO BE SOLVED: To provide a method and a system for performing real time in-situ monitoring the steps in a tool during a semiconductor wafer manufacturing process. SOLUTION: This system includes a tool 11, a computer 12 connected thereto, an endpoint detection control unit a data base, and a supervisor for monitoring the step and the overall wafer process. Control units 16-1 and 16-2 are used to monitor important process parameters in the steps and takes in-situ measurements. Changes in process parameters, corresponding to normal operation conditions and every predetermined deviations, are inputted into the database. During the process, the important parameters are monitored constantly by the control unit. Signals are encoded real time in-situ, analyzed and compared with the corresponding data stored in the database by a supervisor 35.
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