Cleaning apparatus and a cleaning method

摘要

In a cleaning apparatus, a cleaning solution spray means itself is given a function of producing OH- ionized water and H+ ionized water and can spray OH- ionized water and H+ ionized water, as cleaning solutions immediately after they are produced, upon a substrate to be cleaned, and one of OH- ionized water and H+ ionized water can be selectively used as a cleaning solution. This cleaning apparatus includes a substrate holding member for holding a substrate to be cleaned, and a cleaning solution spray member for spraying a cleaning solution upon the substrate. The cleaning solution spray member includes an electrolytic ion generating member for radical-activating or ionizing pure water, and an ultrasonic wave generating member for spraying the radical-activated or ionized pure water, by carrying it on ultrasonic waves, upon the substrate.