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发明名称
ETCHING GAS FOR FERROELECTRIC FILM
摘要
申请公布号
KR100234363(B1)
申请公布日期
1999.12.15
申请号
KR19970000523
申请日期
1997.01.10
申请人
SAMSUNG ELECTRONICS CO, LTD.
发明人
JU, SUK-HO;YU, MIN-HEE;OH, SANG-JUNG;YU, CHA-YOUNG
分类号
H01L21/302;(IPC1-7):H01L21/302
主分类号
H01L21/302
代理机构
代理人
主权项
地址
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