发明名称 CMP PAD CONDITIONING DISC AND CONDITIONER, MANUFACTURE OF DISC, AND REGENERATING METHOD AND CLEANING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a CMP pad conditioning disc and a conditioner that can improve polishing pad conditioning effect, and to provide methods of manufacturing, regenerating and cleaning this disc. SOLUTION: In this CMP pad conditioning disc 30, areas divided by polishing grain sizes are partitioned on the surface of a disc body 31 and formed by repeated execution of intersecting adhesive films in specified thickness on the disc body 31. The polishing grains are detached from the body 31 of the already used conditioning disc 30. As a method of cleaning the conditioning disc 30, the already used conditioning disc 30 is submerged in a hydrogen fluoride or BOE solution to eliminate a membranaceous by-product to clean the disc 30. The conditioning ability and service life of a polishing pad are therefore improved, and cost is reduced.
申请公布号 JPH11300601(A) 申请公布日期 1999.11.02
申请号 JP19980330790 申请日期 1998.11.20
申请人 SAMSUNG ELECTRONICS CO LTD 发明人 CHO SUNG-BUM;CHOI BAIK-SOON;KIM JIN-SUNG;SAI KEISO
分类号 B24B53/14;B24B53/017;B24B53/12;B24D3/00;B24D3/06;B24D7/00;B24D7/06;B24D7/14;B24D18/00;H01L21/304 主分类号 B24B53/14
代理机构 代理人
主权项
地址