A photoresist polymer composition and the method of preparing the photoresist

摘要

A polymer for use in a photoresist comprises three or more different monomers and has an acid labile malonate ester group, such as di-t-butylmalonate or di-tetrahydropyranylmalonate, bound to the polymer backbone. The method of preparing the polymer for use in a photoresist is disclosed. The photoresist composition comprising the polymer and a photosensitive generator is suitable for forming a pattern having an excellent profile due to the high contrast and high thermal decomposition temperature of the photoresist composition.