| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a wafer positioning device having high accuracy for preventing a positioned wafer from being shifted to a driving roller side, without generating particles. SOLUTION: This device is provided with a roller 23 for supporting a stopped wafer arranged between a driving roller 21 and a part right below a center line passing through the center CC of the wafer CW with plural notches which are vertically held by a wafer cassette 10 and a support part 24 arranged at the rear part of a projection part 22 viewing from the directly below. Thus, at the positioning of the wafer, when the notch of the rotated wafer CW is engaged with the upper edge of the projection part 22, the roller 23 for supporting the stopped wafer and the support part 24 cooperate with the projection part 22 and support the wafer CW with high accuracy, and even if the wafer CW attempts to shift to the driving roller side, the roller 23 for supporting the stopped wafer blocks it, and the wafer CW is completely disconnected from the driving roller 21 so as not to make the wafer CW generate the particles and to be positioned in a fixed direction.</p> |
