发明名称 Plasma deposited substrate structure
摘要 A substrate structure having three-dimensional functional film network comprising a plurality of radio frequency discharge plasma film layers. The plasma film layers include a first layer, comprising a plurality of a first functional group, and a second layer, comprising a plurality of a second functional group. The employment of three-imensional film networks with desired functional groups located either on the periphery or both the periphery and interstitial spaces of the networks provides means for significantly increasing the surface functional density.
申请公布号 US5962138(A) 申请公布日期 1999.10.05
申请号 US19970976827 申请日期 1997.11.24
申请人 TALISON RESEARCH, INC. 发明人 KOLLURI, OMPRAKASH S.;JOHANSON, ROBERT G.
分类号 H05H1/02;B05D1/36;B05D7/00;B05D7/24;C08F2/46;C08F2/48;C08F8/00;C08G83/00;C23C14/28;H05B6/00;H05B6/46;H05H1/24;(IPC1-7):C08F2/46;C08J7/18 主分类号 H05H1/02
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