发明名称 |
Method of manufacturing a semiconductor nanoparticle |
摘要 |
A reaction in which a surface-treating material for providing a semiconductor nanoparticle with one or more kinds of electron-releasing groups is added and in which the electron-releasing groups are arranged on the surface of the semiconductor nanoparticle is accelerated by irradiating the semiconductor nanoparticle with light during surface modification, thereby reducing the reaction time.
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申请公布号 |
US2005170530(A1) |
申请公布日期 |
2005.08.04 |
申请号 |
US20050046715 |
申请日期 |
2005.02.01 |
申请人 |
SATO KEIICHI;KUWABATA SUSUMU |
发明人 |
SATO KEIICHI;KUWABATA SUSUMU |
分类号 |
B82B3/00;C09K11/02;C09K11/08;C09K11/54;C09K11/55;C09K11/56;C09K11/59;C09K11/62;C09K11/66;C09K11/67;C09K11/68;C09K11/70;C09K11/74;(IPC1-7):H01L21/00 |
主分类号 |
B82B3/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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