发明名称 Method of manufacturing a semiconductor nanoparticle
摘要 A reaction in which a surface-treating material for providing a semiconductor nanoparticle with one or more kinds of electron-releasing groups is added and in which the electron-releasing groups are arranged on the surface of the semiconductor nanoparticle is accelerated by irradiating the semiconductor nanoparticle with light during surface modification, thereby reducing the reaction time.
申请公布号 US2005170530(A1) 申请公布日期 2005.08.04
申请号 US20050046715 申请日期 2005.02.01
申请人 SATO KEIICHI;KUWABATA SUSUMU 发明人 SATO KEIICHI;KUWABATA SUSUMU
分类号 B82B3/00;C09K11/02;C09K11/08;C09K11/54;C09K11/55;C09K11/56;C09K11/59;C09K11/62;C09K11/66;C09K11/67;C09K11/68;C09K11/70;C09K11/74;(IPC1-7):H01L21/00 主分类号 B82B3/00
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