发明名称 |
NOVEL PROCESS FOR PREPARING RESISTS |
摘要 |
A resist composition is prepared by reacting an alkali-soluble polymer having a phenolic hydroxyl or carboxyl groups with a vinyl ether compound in an aprotic solvent, such as propylene glycol monomethyl ether acetate, in the presence of an acid catalyst, suspending the reaction by the addition of a base, and directly adding a photoacid generator to the reaction solution. When a dialkyl dicarbonate is used in stead of the vinyl ether compound, a resist composition is prepared by carrying out the reaction in the presence of a basic catalyst and adding a photoacid generator directly to the reaction. Thus resist compositions can be prepared without isolating or purifying an alkali-soluble polymer which has been substituted by a catalytic reaction. <IMAGE> |
申请公布号 |
EP0942329(A1) |
申请公布日期 |
1999.09.15 |
申请号 |
EP19980940555 |
申请日期 |
1998.08.26 |
申请人 |
CLARIANT FINANCE (BVI) LIMITED |
发明人 |
OKAZAKI, HIROSHI;PAWLOWSKI, GEORG;FUNATO, SATORU;KINOSHITA, YOSHIAKI;YAMAGUCHI, YUKO |
分类号 |
C08F8/00;C08F212/14;C08F257/02;C08L25/18;C09D125/18;G03F7/004;G03F7/039 |
主分类号 |
C08F8/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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