| 摘要 |
PROBLEM TO BE SOLVED: To relatively easily judge the availability of the use of a mask for manufacturing a reflective type CGH(computer hologram) element to photolithography. SOLUTION: Whether or not plural projecting area parts 15a and 15b are included in a lens area 16 indicated by optical path difference functions ρ(x, y) is judged, and when the plural projecting area parts are included, the objective lens area is divided so that only one projecting area part 15a and 15b are included in each lens area 16. A width dimension P of a mask part 14b on a boundary 16 of the lens area in which one projecting area part is included is calculated, and the minimum width dimensional Pmin of the calculated width dimension P is calculated for each lens area 16. The calculated minimum width dimension Pmin is compared with the allowable error amounts in photolithography, and whether or not masks 13a and 13b including the mask part 14b can be applied to the photolithography is judged. |
