发明名称 FACILITY UNIT-STATE MANAGEMENT FOR SEMICONDUCTOR MANUFACTURING FACILITY MANAGEMENT SYSTEM
摘要 <p>PROBLEM TO BE SOLVED: To prevent stagnation of production lots by effectively managing the volume of production in entire facilities. SOLUTION: The method includes a step S10 of receiving unit operating-state data in each facility from each facility server, a step S20 of judging the presence or absence of specific one of the facilities which issued abnormal unit operating- state data, a step S30 of judging whether or not all units in the specific facility are in their not-operated state in the presence of the specific facility which issued the abnormal unit operating-state data, a step S40 of cutting off all step condition data downloaded in the specific facility when all the units of the specific facility are in the not-operated state, and a step S50 of grasping not-operated one of the units in the specific facility and then cutting off specific step condition data downloaded in the not-operated unit when all the units of the specific facility are not in their not-operated state. As a result, the overall volume of production can be effectively managed and accumulation of a flow of lots can be prevented.</p>
申请公布号 JPH11214278(A) 申请公布日期 1999.08.06
申请号 JP19980212554 申请日期 1998.07.28
申请人 SAMSUNG ELECTRONICS CO LTD 发明人 LIM YONG-IL
分类号 H01L21/677;G05B19/418;H01L21/00;H01L21/02;(IPC1-7):H01L21/02;H01L21/68 主分类号 H01L21/677
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