发明名称 Semiconductor light emitting device and method for fabricating the same
摘要 <p>In a II-VI group semiconductor laser, on an n type GaAs substrate, n type ZnSe layer, a multiquantum well layer of a ZnCdSe well layer and a ZnSe barrier layer, and a p type ZnSe layer are deposited in this order. A polycrystalline ZnO layer is provided on both sides of the p type ZnSe layer for constricting current. Multifilm reflecting mirrors, respectively constituted with a polycrystalline SiO2 layer and a polycrystalline TiO2 layer, for obtaining laser oscillation are provided on, the p type ZnSe layer as well as on a surface of the n type ZnSe layer exposed by etching the GaAs substrate. Furthermore, a p type AuPd electrode and an n type AuGeNi electrode are respectively provided. Alternatively, on an n type GaAs substrate, an n type ZnSe epitaxial layer, an n type ZnMgSSe cladding layer, an n type ZnSSe optical waveguide layer, a ZnCdSe active layer, a p type ZnSSe optical waveguide layer, a p type ZnMgSSe cladding layer, a p type ZnTe contact layer and a polycrystalline ZnO burying layer are respectively formed. Furthermore, a p type AuPd electrode and an n type In electrode are respectively provided.</p>
申请公布号 EP0924824(A2) 申请公布日期 1999.06.23
申请号 EP19990102776 申请日期 1996.01.18
申请人 MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. 发明人 YOKOGAWA, TOSHIYA;YOSHII, SHIGEO;SASAI, YOICHI
分类号 H01L33/00;H01L33/10;H01L33/28;H01L33/46;H01S5/183;H01S5/20;H01S5/22;H01S5/223;H01S5/327;H01S5/347;(IPC1-7):H01S3/19;H01S3/085 主分类号 H01L33/00
代理机构 代理人
主权项
地址