发明名称 |
Apparatus and method for cleaning semiconductor wafers |
摘要 |
A method of cleaning a semiconductor wafer comprises placing liquid in a bath with a gas-liquid-interface defined at the surface of the liquid. A semiconductor wafer is placed in the bath so that it is oriented in a generally upright position with at least part of the wafer being in the liquid and below the gas-liquid-interface. Sonic energy is directed through the liquid. At least one of the position of the semiconductor wafer and the level of liquid in the bath relative to the semiconductor wafer is varied so that the entire surface of the wafer repeatedly passes through the gas-liquid-interface. <IMAGE> |
申请公布号 |
SG63637(A1) |
申请公布日期 |
1999.03.30 |
申请号 |
SG19960009199 |
申请日期 |
1996.04.17 |
申请人 |
MEMC ELECTRONIC MATERIALS, INC. |
发明人 |
HOLLANDER EUGENE ROBERT;ERK, HENRY, F.;CHAI JING;BARTRAM RONALD DEAN |
分类号 |
H01L21/304;B08B3/10;B08B3/12;H01L21/00;H01L21/306 |
主分类号 |
H01L21/304 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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