| 摘要 |
PROBLEM TO BE SOLVED: To enable development with an alkaline aq. soln., to ensure high sensitivity and high resolution and to easily form a patterned thin film excellent in insulating property, flatness, etc., by using a specified fluorine-contg. copolymer, an acid generating compd. and an org. solvent. SOLUTION: The radiation sensitive resin compsn. consists of a fluorine-contg. copolymer of hexafluoropropylene, a compd. having an ethylenically unsatd. bond and an acid-decomposable group represented by the formula, an unsatd. carboxylic acid and/or its anhydride and an unsatd. compd. copolymerizable with these three components, an acid generating compd., a crosslinking compd. and an org. solvent which dissolves these components. In the formula, M is C, Si, etc., R<1> -R<3> are individually H, 1-10C linear alkyl, etc., and two of R<1> -R<3> may bond to each other to form a 4- to 7-membered ring in combination with M to which they are bonded. |
