| 摘要 |
<p>A method for applying coatings to substrates (22) using combustion chemical vapor deposition by mixing together a reagent and a carrier solution to form a reagent mixture (12), igniting the reagent mixture to create a flame, or flowing the reagent mixture (12) through a plasma torch, in which the reagent is at least partially vaporized into a vapor phase, and contacting the vapor phase of the reagent to a substrate resulting in the deposition, at least in part from the vapor phase, of a coating of the reagent which can be controlled so as to have a preferred orientation on the substrate, and an apparatus to accomplish this method. This process can be used to deposit coatings of oxides, nitrides, carbides, fluorides, borides, and some elements. In addition, this process can be used to deposit thin phosphate films and coatings.</p> |
