Mehrfache Strahlaustastblendenvorrichtung und Herstellungsverfahren derselben

摘要

The array is intended to be used in an electron beam exposure system and is obtained by forming an electrode layer (34) on a substrate (20) having shift register devices (24). An electron beam aperture (38) is formed in a same position through the substrate and electrode layer, so as to effectively form deep electron beam apertures.