| 摘要 |
PROBLEM TO BE SOLVED: To provide an electron beam exposure device, which uses a plurality of flat-plate type electron beam sources aligned on a substrate and can perform exposure with the electron beams having the uniform intensity distribution. SOLUTION: This device has the following parts. In a flat-plate type electron beam source 1, a plurality of minute electron beam sources la are aligned on the plane at a constant interval S. A reticle-supporting part supports a reticle for aligning the electron beams from the flat-plate type electron beam source 1 into the desired pattern shape. A stage supports the exposure object, on which the electron beams passed through the reticle must be irradiated. The flat-plate type electron beam source and the reticle supporting part are arranged at a position 7t where an interval Z2 between the flat-plate type electron beam source 1 and the reticle satisfies, Z2 =S/(2tanα), (where, S is the interval between minute electron beam sources 1a of the flat-plate type electron beam source 1, andαindicates the radiation angle of the electron beam radiated from the minute electron beam source 1a).
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