发明名称 DEVICE AND METHOD FOR EVENING OUT THE THICKNESS OF METAL LAYERS ON ELECTRICAL CONTACT POINTS ON ITEMS THAT ARE TO BE TREATED
摘要 The invention relates to a device and method for evening out the thickness of metal layers on electrical contact points on items to be treated (7), such as conductor foil and printed circuit boards, during electrolytic treatment thereof whereby said items are guided on a horizontal plane of conveyance in a continuous electroplating plant. The device comprises two counter electrodes (2,3) located opposite said plane of conveyance and clamps (4) secured to a continuously revolving means of conveyance (5) for contacting the items to be treated (7). The clamps have an electroconductive lower part (14) and upper part (15) with a surface consisting of metal. Both parts can move in relation to each other and have at least one contact point for the items to be treated (7). At least one power source is also provided to produce a current flow between the counter electrodes and the items to be treated. In order to avoid a pirate cathode effect in the contact clamps (4) during electrolytic metallization, upper and lower shields (15,16) for the electric field are arranged between the anodes (2,3) and the clamps (4). Said shields extend so closely to the plane of conveyance that the items to be treated (7) which are guided on said plane and the clamp parts (13,14) do not to come into contact with the shields.
申请公布号 WO9910568(A2) 申请公布日期 1999.03.04
申请号 WO1998DE02503 申请日期 1998.08.19
申请人 ATOTECH DEUTSCHLAND GMBH;KOPP, LORENZ;LANGHEINRICH, PETER;SCHNEIDER, REINHARD 发明人 KOPP, LORENZ;LANGHEINRICH, PETER;SCHNEIDER, REINHARD
分类号 C25D17/00;C25D5/00;C25D17/06;H05K3/18;H05K3/24 主分类号 C25D17/00
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