| 摘要 |
PROBLEM TO BE SOLVED: To provide an aligner which is capable of collecting an SR(synchrotron radiation) beam having a large angle of horizontal divergence, increasing the intensity of an irradiation on a exposed plane, irradiating the exposed plane with an approximately equal intensity, and precisely transferring a micro pattern. SOLUTION: A mirror comprises a first mirror 72 which collects and reflects a radiation beam 71 radiated with a large angle of divergence, and a second mirror 73 which receives the reflected radiation beam and irradiating a mask used for transferring a pattern on a wafer. A shape of the reflection plane of the first mirror 72 is made concave in x-axis and y-axis directions, and a shape of the reflection plane of the second mirror 73 is made convex in y-axis direction. The reflection plane of the first and second mirror are shaped, and the first and second mirror and the mask are arranged, so that the radiation beam radiated horizontally from a beam source can irradiate a whole exposure region 76 on the wafer, with an approximately equal intensity, through the first and second mirror. |
