发明名称 Water-developing photosensitive resin composition
摘要 The present invention provides a photosensitive resin composition which is superior in water-developing properties, resilience, strength of resin plate after exposure, elongation at break, and transparency of resin plate. The composition comprises: (1) a particulate copolymer obtained by polymerizing a monomer mixture comprising: (a) an aliphatic conjugated diene monomer, (b) a monomer represented by the following general formula (I): <IMAGE> (I) and (c) a monomer having at least two groups capable of addition-polymerizing; (2) a photopolymerizable unsaturated monomer; (3) an amino group-containing compound; and (4) a photopolymerization initiator.
申请公布号 US5861232(A) 申请公布日期 1999.01.19
申请号 US19960657612 申请日期 1996.05.31
申请人 NIPPON PAINT CO., LTD.;JAPAN SYNTHETIC RUBBER CO., LTD. 发明人 KANDA, KAZUNORI;UEDA, KOICHI;KAKIUCHI, TADAHIRO;MURAMOTO, HISAICHI;KOSHIMURA, KATSUO;YASUDA, KENJI;SATO, HOZUMI;NISHIOKA, TAKASHI
分类号 G03F7/004;G03F7/00;G03F7/027;G03F7/033;(IPC1-7):G03F7/033 主分类号 G03F7/004
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