发明名称 GAS-BARRIER THIN MEMBRANE AND ITS PRODUCTION
摘要 PROBLEM TO BE SOLVED: To obtain the subject thin membrane having high gas-barrier effect while retaining the polymer's practical properties, also reduced in environmental burden in its production and disposal, and useful in electrical/electronic parts, etc., by subjecting a specific thin film to ionic irradiation treatment to effect carbonizing part of the thin film. SOLUTION: A thin film predominant in a polymer (e.g. polysulfone, polyimide composed of a recurring unit of the formula) is subjected to ionic irradiation treatment under an acceleration voltage of e.g. 0.1-3,000 keV to effect carbonizing part of the thin film so as to be 80-95 element % in the carbon element rate in the constituent elements determined by electron spectroscopy for chemical analysis(ESCA) on at least one surface of the thin film. It is preferable that the resultant aimed thin membrane has asperities 10-1,000 nm in height throughout at least one surface thereof, being >=0.3μm in thickness and representing a uniform, asymmetric or laminated structure.
申请公布号 JPH1112374(A) 申请公布日期 1999.01.19
申请号 JP19970180751 申请日期 1997.06.20
申请人 NITTO DENKO CORP 发明人 SHIMAZU AKIRA;MIYAZAKI TSUKASA;IKEDA KENICHI;SEKI MASAHARU
分类号 C08J7/00;C08J7/12;(IPC1-7):C08J7/00 主分类号 C08J7/00
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