| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing a halftone phase shift mask capable of generating a light shield pattern of an HTPSM(halftone phase shift mask) in a practical processing time. SOLUTION: Light shield pattern area data and light shield pattern removal area data are extracted from the layout data of halftone phase shift masks (S12, S13), a coordinate of a transmission light part decided in accordance with this light shield pattern area data is normalized to be registered in an array area table, the transmission light part that the coordinate is registered and crosses with the light shield pattern removal area is retrieved by referring to the array area table based on the light shield pattern removal area data (S15), regarding the retrieved transmission light part, the coordinate of a rectangular transmission light part newly generated so as to remove the part crossing with the light shield pattern removal area is registered in the array area table (S17) and the plotting data of the light shield pattern are generated from the array area table. |
