MANUFACTURE OF VACUUM MICRO ELEMENT

摘要

PROBLEM TO BE SOLVED: To provide a manufacturing method of a vacuum micro element using diamond on its emitter. SOLUTION: A silicon board 102 is coated on its surface with an oxide film serving as a gate insulating layer 101 and further a molybdenum(Mo) film serving as a gate electrode layer 103 is formed. The insulating layer 101 and the electrode layer 103 is partly etched to form an opening, in which diamond is grown. The diamond is raised there into the shape of a circular cone so as to gradually close the opening. The diamond depositing on the Mo layer 103 is finally peeled off to finish a vacuum micro element.