发明名称 |
Illumination method and system having a first optical element at a position optically conjugate with an object and a second optical element closer to the object and on a pupil plane of the system |
摘要 |
An illumination system for illuminating an object, such as a system for detecting an alignment mark on a semiconductor wafer. The system includes a light source and an illumination optical system for directing light from the light source toward an object to be illuminated. A first optical element, which preferably is a hologram, is provided in a portion of the light path of the illumination optical system at a position optically conjugate with the object and has a function of amplitude-dividing the light and deflecting a divided light ray. A second optical element, which also preferably is a hologram, is provided in a portion of the light path that is closer to the object as compared to the first optical element and is disposed on a pupil plane of the illumination optical system. The second optical element also has a function of amplitude-dividing the light and deflecting a divided light ray.
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申请公布号 |
US5808724(A) |
申请公布日期 |
1998.09.15 |
申请号 |
US19960620644 |
申请日期 |
1996.03.22 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
INA, HIDEKI;KANDA, TSUNEO |
分类号 |
G02B5/32;G03F9/00;H01L21/027;(IPC1-7):G03B27/42;G01B11/00 |
主分类号 |
G02B5/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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