发明名称 Filmherstellungsverfahren und Einstellvorrichtung dazu
摘要 The invention concerns a method of producing protective films or the like used as protective covers for photomasks or reticles. To peel a thin film (6) off a substrate (5), a peeling jig (8) constituted by a flexible annular frame (2) with an adhesive (10) applied thereon is pressed against the thin film applied on the substrate; a portion of the peeling jig is grabbed after the peeling jig and the thin film are adhered together; and the peeling jig and the film are peeled off the substrate. Before adhering the peeled film onto a side end surface of a pericle frame (21), of the two edges of the pericle frame, at least the edge formed by an inside surface thereof and the side end surface thereof is chambered.
申请公布号 DE3856223(D1) 申请公布日期 1998.08.27
申请号 DE19883856223 申请日期 1988.05.27
申请人 MITSUI CHEMICALS, INC., TOKIO/TOKYO, JP 发明人 KAYA, TOSHIO, IWAKUNI-SHI, YAMAGUCHI-KEN, JP;FUJIMOTO, MAKOTO, WAKI-CHO, KUGA-GUN, YAMAGUCHI-KEN, JP;NAKAGAWA, HIROAKI, IWAKUNI-SHI, YAMAGUCHI-KEN, JP
分类号 G03F1/64;(IPC1-7):G03F1/14 主分类号 G03F1/64
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