发明名称 POWER SUPPLY UNIT FOR SPUTTERING DEVICE
摘要 In a circuit for preventing arc discharge by applying a reverse voltage pulse, after completion of application of a reverse voltage pulse, a reverse voltage generated by reverse voltage generating means (12) within 1-10 mu s in the case where generation of arc discharge is detected by arc discharge detecting means (23), is applied to a sputtering source, thereby lowering the generation probability of continuous arc discharge. At the same time, a currrent at the time of application of the reverse voltage is limited by a diode (D10) connected in series with the sputtering source (14) and a resistor (r10) connected in parallel with the diode (D10), thereby reducing continuous arc discharge due to reverse arc discharge.
申请公布号 WO9837257(A1) 申请公布日期 1998.08.27
申请号 WO1998JP00693 申请日期 1998.02.19
申请人 SHIBAURA ENGINEERING WORKS CO., LTD.;KURIYAMA, NOBORU;YATSU, YUTAKA;KAWAMATA, YOSHIO;FUJII, TAKASHI 发明人 KURIYAMA, NOBORU;YATSU, YUTAKA;KAWAMATA, YOSHIO;FUJII, TAKASHI
分类号 C23C14/34;C23C14/54;H01J37/34;(IPC1-7):C23C14/34;H01L21/203;H01L21/285 主分类号 C23C14/34
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