发明名称 |
POWER SUPPLY UNIT FOR SPUTTERING DEVICE |
摘要 |
In a circuit for preventing arc discharge by applying a reverse voltage pulse, after completion of application of a reverse voltage pulse, a reverse voltage generated by reverse voltage generating means (12) within 1-10 mu s in the case where generation of arc discharge is detected by arc discharge detecting means (23), is applied to a sputtering source, thereby lowering the generation probability of continuous arc discharge. At the same time, a currrent at the time of application of the reverse voltage is limited by a diode (D10) connected in series with the sputtering source (14) and a resistor (r10) connected in parallel with the diode (D10), thereby reducing continuous arc discharge due to reverse arc discharge.
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申请公布号 |
WO9837257(A1) |
申请公布日期 |
1998.08.27 |
申请号 |
WO1998JP00693 |
申请日期 |
1998.02.19 |
申请人 |
SHIBAURA ENGINEERING WORKS CO., LTD.;KURIYAMA, NOBORU;YATSU, YUTAKA;KAWAMATA, YOSHIO;FUJII, TAKASHI |
发明人 |
KURIYAMA, NOBORU;YATSU, YUTAKA;KAWAMATA, YOSHIO;FUJII, TAKASHI |
分类号 |
C23C14/34;C23C14/54;H01J37/34;(IPC1-7):C23C14/34;H01L21/203;H01L21/285 |
主分类号 |
C23C14/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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