发明名称 Wafer processing apparatus and wafer processing method
摘要 <p>A wafer is supported while being rotated by four wafer rotating rods having grooves. The wafer rotating rods are rotated by a driving force transmitted from a motor installed outside a wafer processing bath. An ultrasonic bath is arranged below the wafer processing bath, and ultrasonic waves generated by an ultrasonic source are transmitted to the wafer processing bath. The ultrasonic waves are efficiently transmitted to the wafer because the wafer is supported only by the wafer rotating rods. &lt;IMAGE&gt;</p>
申请公布号 EP0856873(A2) 申请公布日期 1998.08.05
申请号 EP19980101824 申请日期 1998.02.03
申请人 CANON KABUSHIKI KAISHA 发明人 SAKAGUCHI, KIYOFUMI
分类号 H01L21/00;H01L21/02;H01L21/20;H01L21/304;H01L21/306;H01L21/311;H01L27/12;(IPC1-7):H01L21/00 主分类号 H01L21/00
代理机构 代理人
主权项
地址