发明名称 Liquid feed vaporization system and gas injection device
摘要 <p>A compact vaporizer system is presented to produce a high quality vapor feed from a liquid feed to be delivered to a chemical vapor deposition processing chamber to produce thin film devices based on highly dielectric or ferroelectric materials such as BaTiO3, SrTiO3 and others such materials. The vaporization apparatus comprises a feed tank (12) for storing the liquid feed; feed delivery means for transporting the liquid feed by way of a feed delivery path; a vaporizer section (22) disposed in the delivery path comprising a high temperature heat exchanger (40) having a capillary tube (14a) for transporting the liquid feed and a heat source for externally heating the capillary tube; and a vaporization prevention section (20) disposed upstream of the vaporizer section for preventing heating effects of the vaporizer section to the liquid feed within the vaporization prevention section.</p>
申请公布号 EP0849375(A2) 申请公布日期 1998.06.24
申请号 EP19970120370 申请日期 1997.11.20
申请人 EBARA CORPORATION 发明人 HORIE, KUNIAKI;SUZUKI, HIDENAO;NAKADA, TSUTOMU;KURIYAMA, FUMIO;MURAKAMI, TAKESHI;ABE, MASAHITO;ARAKI, YUJI;UEYAMA, HIROYUKI
分类号 C23C16/44;C23C16/448;C23C16/455;(IPC1-7):C23C16/44;B01D1/00 主分类号 C23C16/44
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