发明名称 PHOTOSENSITIVE RESIN COMPOSITION AND ITS USE
摘要 PROBLEM TO BE SOLVED: To obtain a photosensitive resin compsn. excellent in close adhesiveness, sensitivity and property of suppressing the generation of sludge and foaming by using a specified polymer binder, an ethylenic unsatd. compd. and a specified photopolymn. initiator as principal components. SOLUTION: This photosensitive resin compsn. contains a polymer binder contg. a compd. represented by formula I and anα,β-unsatd. carboxyl group- contg. monomer as essential copolymerizable components, an ethylenic unsatd. compd. and a photopolymn. initiator contg. 9-phenylacridine and a compd. represented by formula II as principal components. In formula I, R1 is H or methyl, R2 is >=4C satd. hydrocarbon and (n) is an integer of 2-5. In the formula II, R3 is an optionally alkyl substd. phenyl and R4 is H or a 1-8C alkyl. This compsn. gives a resist excellent in close adhesiveness to a metallic substrate and photosensitivity, ensures a small amt. of sludge generated at the time of development and is excellent also in property of suppressing the foaming of a developer.
申请公布号 JPH10123707(A) 申请公布日期 1998.05.15
申请号 JP19960297326 申请日期 1996.10.17
申请人 NIPPON SYNTHETIC CHEM IND CO LTD:THE 发明人 KOSAKA EIJI;AOKI KEI
分类号 G03F7/027;G03F7/028;G03F7/033;H05K3/06;(IPC1-7):G03F7/027 主分类号 G03F7/027
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