发明名称 |
Substrate carrier, port apparatus and facility interface and apparatus including same |
摘要 |
An apparatus includes a first enclosure, a first door, at least one first valve, at least one inlet diffuser and at least one substrate holder. The first enclosure has a first opening. The first door is configured to seal the first opening. The first valve is coupled to the first enclosure. The inlet diffuser is coupled to the first valve and configured to provide a first gas with a temperature substantially higher than a temperature of an environment around the first enclosure. Each substrate holder disposed within the first enclosure supports at least one substrate.
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申请公布号 |
US7758338(B2) |
申请公布日期 |
2010.07.20 |
申请号 |
US20070754789 |
申请日期 |
2007.05.29 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. |
发明人 |
HSIAO YI-LI;YU CHEN-HUA;WANG JEAN;TIEN FU-KANG;HUNG JUI-PIN |
分类号 |
F27B5/16 |
主分类号 |
F27B5/16 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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