发明名称 LIGHTING OPTICAL SYSTEM FOR SEMICONDUCTOR MANUFACTURING DEVICE
摘要 PROBLEM TO BE SOLVED: To maintain the uniformity of the illuminance regardless of the intensity unevenness and, further, reduce the interference noises. SOLUTION: A group of N×M 2-dimensional beams are generated from a beam emitted from a laser light source 1 by a 2-dimensional multibeam generating optical system 2 which consists of 1st and 2nd 1-dimensional multibeam generating optical systems 3 and 4. The group of N×M 2-dimensional beams are made to pass through fly-eye lens arrays 7a and 7b, condensor lenses 8a and 8b and a reticle 20. The 2-dimensional multibeam generating optical system 2 is constructed so as to have the light passage length difference between two arbitrary beams selected from the group of N×M beams not shorter than a coherence length determined by the time coherence of the laser light source 1 and the group of 2-dimensional beams are applied to the fly eye lens arrays 7a and 7b through one or a plurality of diffusion plates 5a and 5b.
申请公布号 JPH10125585(A) 申请公布日期 1998.05.15
申请号 JP19960294443 申请日期 1996.10.15
申请人 NIKON CORP 发明人 GOTO AKIHIRO;ICHIHARA YUTAKA
分类号 G03F7/20;H01L21/027;(IPC1-7):H01L21/027 主分类号 G03F7/20
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