发明名称 COATING APPLICATION METHOD FOR HARD SUBSTRATE AND DEVICE THEREFOR
摘要 PROBLEM TO BE SOLVED: To prevent the occurrence of the unevenness of coating application and to make a coating application thickness uniform by executing coating application while controlling at least either of the rotating speed of a microrodbar and the rotating speed of a nip roller in such a manner that the circumferential speed of the microrodbar coincides with the actual moving speed of a hard substrate during the coating application of the substrate. SOLUTION: The actual moving speed VR of the glass substrate is determined. Next, the rotating speeds Va+ΔVa, Vb+ΔVb of motors 26, 28 are determined in order to match the circumferential speeds of the microrodbar 14 and the transporting rollers 22 with the moving speed VR. The correction ratesΔVa andΔVb thereof are stored in a memory. The speeds of the motors 26, 28 are thereafter controlled to Va+ΔVa, Vb+ΔVb by using these correction rates. The speed of the motor 30 of the nip roller 20 is not changed and is controlled as it is. The circumferential speed of the microrodbar 14 is matched with the actual moving speed VR of the glass substrate in such a manner and, therefore, the relative speed difference between the microrodbar 14 and the glass substrate is kept always zero.
申请公布号 JPH10118541(A) 申请公布日期 1998.05.12
申请号 JP19960294659 申请日期 1996.10.17
申请人 FUJI PHOTO FILM CO LTD 发明人 YAO YASUYOSHI;OZAKI MASABUMI;OTSU MASAO;EMOTO TATSUYA;YAMAZAKI SHINYA
分类号 B05D1/28;B05C1/02;(IPC1-7):B05C1/02 主分类号 B05D1/28
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