发明名称 TWO-MODE SURFACE DEFECT TESTING SYSTEM
摘要 <p>A two-mode surface defect testing device comprises a first source of substantially collimated light (12) which pases along a first light path system to direct the collimated light to a holder (32) for a surface under test. The surface reflects the light which is received and directed from the surface through at least some of the first light path system to an image processing apparatus (38). A second source of light (50) is also provided, for providing non-collimated light from the second source to a surface under test, which may be the same surface as above. This non-collimated light is reflected from the surface to an image processing apparatus. The light may be non-polarized. By the use of two modes of testing, defects may be detected at the outer surface of a transparent coating over an opaque surface, and defects in the opaque surface itself may also be detected.</p>
申请公布号 WO1998016815(A1) 申请公布日期 1998.04.23
申请号 US1997018451 申请日期 1997.10.15
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