发明名称 DUST DETECTING SYSTEM FOR SEMICONDUCTOR ALIGNER
摘要 <p>PROBLEM TO BE SOLVED: To provide a simple dust detecting system for a semiconductor aligner, which can detect presence or absence of dust on a substrate holding means or a substrate and detect a dust presence position and can localizedly clean the aligner on the basis of its detected result. SOLUTION: Such a flat plate made of having a predetermined flatness and allowing light permission therethrough as an optical flat 1 is contacted with a substrate holding means 2, so that a laser beam oscillated and emitted in and from a laser light source 4 is illuminated toward the substrate holding means 2. When a dust 3 is deposited on the substrate holding means 2, this causes generation of a gap between the optical flat 1 and substrate holding means 2, whereby an operator can observe interference fringes. The interference fringes are detected by a photoelectric converting element 6, displayed on a monitor 7, and processed by an image processor 8 to thereby judge a dust presence position. On the basis of its detected result, a dust removing means is moved to the dust presence position to clean the position localizedly and positively.</p>
申请公布号 JPH1070069(A) 申请公布日期 1998.03.10
申请号 JP19960245694 申请日期 1996.08.28
申请人 CANON INC 发明人 MARUMO KOJI;MIZUSAWA NOBUTOSHI;ETO MAKOTO
分类号 G03F7/20;G03F9/00;H01L21/027;H01L21/304;H01L21/68;H01L21/683;(IPC1-7):H01L21/027 主分类号 G03F7/20
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