发明名称 Excimer laser oscillation apparatus and method, excimer laser exposure apparatus, and laser tube
摘要 <p>This invention relates to an excimer laser oscillation apparatus which has a laser chamber (20) which stores a laser gas containing a gas mixture of at least one inert gas selected from the group consisting of Kr, Ar, and Ne, and F2 gas, and in which an inner surface thereof has a reflection-free surface (3) with respect to light of a desired wavelength of 248 nm, 193 nm, or 157 nm, and the uppermost surface of the inner surface consists of a fluoride, an optical resonator which is made up of a pair of reflection mirrors (5,6) arranged to sandwich the laser chamber (20) therebetween, and in which the reflectance of the reflection mirror (6) on the output side is 90% or more and microwave introduction means (300,303,302), arranged on the laser chamber (20), for continuously exciting the laser gas in the laser chamber (20). &lt;IMAGE&gt;</p>
申请公布号 EP0820132(A2) 申请公布日期 1998.01.21
申请号 EP19970305404 申请日期 1997.07.18
申请人 CANON KABUSHIKI KAISHA;OHMI, TADAHIRO 发明人 OHMI, TADAHIRO;TANAKA, NOBUYOSHI;HIRAYAMA, MASAKI
分类号 H01S3/041;H01S3/08;H01S3/0975;H01S3/225;(IPC1-7):H01S3/097 主分类号 H01S3/041
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