METHOD FOR MANUFACTURING METAL WIRING CONTACT

摘要

A method for fabricating contact hole of metal wire is disclosed. The method for fabricating contact hole of metal wire according to the present invention comprises: a) connecting a first polysilicon layer pattern(23) used for a wordline strap with a second polysilicon layer pattern(26) via a first contact hole(25); b) connecting the second polysilicon layer pattern(26) with a third polysilicon layer pattern(30) via a second contact hole(28) formed on an area except for overlapped area with the first contact hole(25); and c) forming a metal wire(29) which is overlapped with the first polysilicon layer pattern(23). Thereby an aspect ratio is decreased and yield and reliability of semiconductor device is improved.