发明名称 Catadioptric optical system and exposure apparatus having the same
摘要 It is an object of the invention to provide a catadioptric optical system with an arrangement for realizing a large numerical aperture and reducing the diameter of a concave mirror while ensuring a sufficient working distance on the image side, and also an exposure apparatus using this catadioptric optical system. A catadioptric optical system according to the invention includes a first imaging optical system for forming an intermediate image of a pattern on a first plane, a second imaging optical system for forming a reduced image of the intermediate image on a second plane, and an optical path deflecting member for guiding a light beam from the first imaging optical system to the second imaging optical system. The first imaging optical system has at least a first optical element group having a positive refracting power, and a second optical element group having a concave mirror and a meniscus lens component with a concave surface facing the first imaging optical system. In particular, the first optical element group having a positive refracting power is arranged to guide a light beam from the first plane to the second optical element group.
申请公布号 US5691802(A) 申请公布日期 1997.11.25
申请号 US19950552453 申请日期 1995.11.03
申请人 NIKON CORPORATION 发明人 TAKAHASHI, TOMOWAKI
分类号 G02B17/08;G03F7/20;(IPC1-7):G03B27/42 主分类号 G02B17/08
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