发明名称 IMPREGNATED CATHODE BASE UNIT, ITS MANUFACTURE AND IMPREGNATED CATHODE
摘要 <p>PROBLEM TO BE SOLVED: To provide an impregnated cathode eliminating necessity for performing a polishing process further without generating a flow of brazing material. SOLUTION: This impregnated cathode is formed by impregnated a base unit, consisting of sintered material of high melting point metal or its alloy, with an emitter. In a content of calcium and phosphor existing as impurity in a grain boundary, in AES analysis, ratio of a peak of calcium and phosphor relating to a peak of high melting point metal or the alloy is set respectively 0.5 or less and 0.2 or less. Deformation Sk of the base unit is -0.7 or more, and a surface is not polished.</p>
申请公布号 JPH09293447(A) 申请公布日期 1997.11.11
申请号 JP19960127625 申请日期 1996.04.25
申请人 TOSHIBA CORP;TOSHIBA ELECTRON ENG CORP 发明人 OKUHATA TAKAHIRO;HAYASHI KEISUKE;YAKABE TORU;FUKUI TSUNEO;SUGAI SHUJI;SAKAI MOTONAO;HARA AKITO
分类号 H01J1/28;H01J9/04;(IPC1-7):H01J1/28 主分类号 H01J1/28
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