发明名称 |
IMPREGNATED CATHODE BASE UNIT, ITS MANUFACTURE AND IMPREGNATED CATHODE |
摘要 |
<p>PROBLEM TO BE SOLVED: To provide an impregnated cathode eliminating necessity for performing a polishing process further without generating a flow of brazing material. SOLUTION: This impregnated cathode is formed by impregnated a base unit, consisting of sintered material of high melting point metal or its alloy, with an emitter. In a content of calcium and phosphor existing as impurity in a grain boundary, in AES analysis, ratio of a peak of calcium and phosphor relating to a peak of high melting point metal or the alloy is set respectively 0.5 or less and 0.2 or less. Deformation Sk of the base unit is -0.7 or more, and a surface is not polished.</p> |
申请公布号 |
JPH09293447(A) |
申请公布日期 |
1997.11.11 |
申请号 |
JP19960127625 |
申请日期 |
1996.04.25 |
申请人 |
TOSHIBA CORP;TOSHIBA ELECTRON ENG CORP |
发明人 |
OKUHATA TAKAHIRO;HAYASHI KEISUKE;YAKABE TORU;FUKUI TSUNEO;SUGAI SHUJI;SAKAI MOTONAO;HARA AKITO |
分类号 |
H01J1/28;H01J9/04;(IPC1-7):H01J1/28 |
主分类号 |
H01J1/28 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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